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Grounding the substrate to the wafer holder, clean room, e-beam lithography (EBL), substrate holder, CIC nanoGUNE, Nanoscience Cooperative Research Center, San Sebastian, Gipuzkoa, Euskadi, Spain Stock Image

Grounding the substrate to the wafer holder, clean room, e-beam lithography (EBL), substrate holder, CIC nanoGUNE, Nanoscience Cooperative Research Center, San Sebastian, Gipuzkoa, Euskadi, Spain
b20-1081702 | age fotostock | Rights Managed
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